Contributor contact details
(* = main contact)
Editor
Y. Nishi
Stanford University, USA
R. Bez* and A. Pirovano
Micron, Process R&D, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
R. Shirota
National Chiao Tung University, Department of Electrical and Computer Engineering, Microelectronics and Information Systems Research Building, 1001 Ta-Hsueh Road, Hsinchu-city, 30010 Taiwan
R. Micheloni* and L. Crippa
PMC-Sierra, Vimercate, Italy
rino.micheloni@ieee.org; luca.crippa@ieee.org
G. Molas*, L. Masoero, V. Della Marca, G. Gay and B. de Salvo
CEA-LETI Minatec Campus, 17 rue des Martyrs, Grenoble, 38054, France
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