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Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)

G. Koster, M. Huijben, A. Janssen,  and G. Rijnders     MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

Abstract

In this chapter, reflection high-energy electron diffraction (RHEED) in combination with pulsed laser deposition (PLD) is described. Both the use of RHEED as a real-time rate-monitoring technique and methods to study nucleation and growth during PLD are discussed. After a brief introduction of RHEED, a case is made for the step density model to describe the intensity variations encountered during deposition. An overview of these intensity variations, the intensity response during an RHEED experiment ...

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