book

Fundamental Principles of Engineering Nanometrology, 2nd Edition

by Richard Leach

May 2014

Intermediate to advanced

384 pages

11h 58m

English

William Andrew

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1.1 What is engineering nanometrology?1.2 The contents of this book and differences to edition 1References
2.1 Introduction to measurement2.2 Units of measurement and the SI2.3 Length2.4 Mass2.5 Force2.6 Angle2.7 Traceability2.8 Accuracy, precision, resolution, error and uncertainty2.9 The laserReferences
3.1 Geometrical considerations3.2 Kinematic design3.3 Dynamics3.4 The Abbe principle3.5 Elastic compression3.6 Force loops3.7 Materials3.8 Symmetry3.9 Vibration isolationReferences
4.1 Traceability in length4.2 Gauge blocks – both a practical and traceable artefact4.3 Introduction to interferometry4.4 Interferometer designs4.5 Measurement of gauge blocks by interferometryReferences

5.1 Introduction to displacement measurement5.2 Basic terms5.3 Displacement interferometry5.4 Strain sensors5.5 Capacitive displacement sensors5.6 Eddy current and inductive displacement sensors5.7 Optical encoders5.8 Optical fibre sensors5.9 Other optical displacement sensors5.10 Calibration of displacement sensorsReferences
6.1 Introduction to surface topography measurement6.2 Spatial wavelength ranges6.3 Historical background of classical surface texture measuring instrumentation6.4 Surface profile measurement6.5 Areal surface texture measurement6.6 Surface topography measuring instrumentation6.7 Optical instruments6.8 Capacitive instruments6.9 Pneumatic instruments6.10 Calibration of surface topography measuring instruments6.11 Uncertainties in surface topography measurement6.12 Metrological characteristics6.13 Comparisons of surface topography measuring instruments6.14 Determination of the spatial frequency response6.15 Software measurement standardsReferences
7.1 Scanning probe microscopy7.2 Scanning tunnelling microscopy7.3 Atomic force microscopy7.4 Examples of physical properties measurement using AFM7.5 Scanning probe microscopy of nanoparticles7.6 Electron microscopy7.7 Other particle beam microscopy techniquesReferences
8.1 Introduction to surface topography characterisation8.2 Surface profile characterisation8.3 Areal surface texture characterisation8.4 Fractal methods8.5 Comparison of profile and areal characterisationReferences
9.1 Introduction to CMMs9.2 Sources of error on CMMs9.3 Traceability, calibration and performance verification of CMMs9.4 Micro-CMMs9.5 Micro-CMM probes9.6 Verification and calibration of micro-CMMsReferences
10.1 Traceability of traditional mass measurement10.2 Low-mass measurement10.3 Low-force measurementReferences
Examples of SI derived units expressed in terms of base unitsSI derived units with special names and symbols

Content preview from Fundamental Principles of Engineering Nanometrology, 2nd Edition

Appendix A

SI Units of Measurement and Their Realisation at NPL

Quantity	Unit (Symbol)	Definition	Realisation
Time	second (s)	The second is the duration of 9 192 631 770 periods of the radiation corresponding to the transition between the two hyperfine levels of the ground state of the caesium 133 atom.	The second is realised by primary caesium frequency standards to about 2 parts in 10¹⁵. The majority are traditional caesium-beam designs, but the latest use lasers to control and detect the atoms.
Length	metre (m)	The metre is the length of the path travelled by light in a vacuum during a time interval of 1/299 792 458 of a second.	At NPL, the metre is currently realised through the wavelength of the 633 nm radiation from an iodine-stabilised ...