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Handbook of Silicon Based MEMS Materials and Technologies by Teruaki Motooka, Ari Lehto, Markku Tilli, Veikko Lindroos

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23.1. Etch Chemistries

23.1.1. RIE Chemistry

Etchant phase, gas or liquid, has been used as a dividing factor: wet etching in liquids vs. dry etching in gaseous environment, usually in vacuum [1].Wet etching depends on solubility of etch products, and dry etching on their volatility:

Many halides, fluorides, chlorides, bromides and iodides are volatile, as are oxyhalides [2, 3]. Typical etch products include SiF4, SiCl4, NF3, WF6, AlCl3 when silicon ...

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