40.3. Getter Films for MEMS Devices
40.3.1. Introduction to Getter Technology for Wafer-Level Packaged MEMS
The use of Non Evaporable Getter (NEG) material (Zr-based alloy) is required to ensure suitable vacuum (total pressure down to 10−4 mbar) and long-term stability in MEMS devices. NEG can chemically sorb all active gasses, including H2O, CO, CO2, O2, N2, and H2.
An NEG captures gasses by means of a chemical reaction between a chemically active metal or alloy (the getter) and a chemically active gas thus forming a solid compound with low vapor pressure. The active gasses are therefore permanently removed from the sealed device. Hydrogen does not react to form a chemical compound but dissolves in the bulk of the getter forming a solid solution. ...
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