2.7. Nanoimprint

Nanoimprint technologies are part of next generation lithography (NGL) [15,33], with the aim to develop new structuring methods for the patterning of nanostructures. The structuring methods refer to a structure size below the pattern size limited by current UV-lithography structuring methods. The motivation for the development of new structuring methods in the nano range was first the current developments in microelectronics, requiring new structuring methods for a further decrease in components for electronic integrated circuits. Furthermore, the structuring methods can also be used to fabricate structures in the nano range for applications in photonics and biotechnology [15].

The process of nanoimprint lithography (NIL) ...

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