In situ ion beam surface characterization of thin multicomponent films
L.V. Goncharova, The University of Western Ontario
Two different approaches to investigation of thin film growth using ion beam analysis and spectroscopy are discussed in this chapter. The first is based on the high-resolution variant of classical Rutherford backscattering spectroscopy, and the second combines mass spectroscopy of recoiled ions with ion scattering and direct recoil. The chapter reviews the theoretical background for the techniques and gives relevant experimental set-up details. Several illustrations of the applications are given where these methods are used to study the phenomena occurring during the growth of high-κ dielectric oxides on ...