
337Surface Manufacturing and Treatment
Chapter 12
at 500 fs (Stuart etal. 1996) with normal incidence and 1.053µm. As far as deposited
thin layers are concerned, the work of M. Mero gives an overview (Mero etal. 2005) of
the comparative levels of performance of various dielectric monolayers deposited by ion
beam sputtering and tested for their resistance at a wavelength of 800nm and with dif-
ferent pulse times. HfO
2
appeared to be the most pertinent choice. is new design gives
a gain in the order of 2 for the laser damage threshold compared to the conventional
gold grating with a threshold of 2.5 J/cm
2
at 1053nm, 1 ps for a MLD 1780 l/mm ...