Chapter 6Film-Free LIFT (FF-LIFT)

Salvatore Surdo, Alberto Diaspro and Martí Duocastella

Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy

6.1 Introduction

The control of inorganic matter into an ever-decreasing size has enabled the technological revolution of the past decades, with developments ranging from computers to medical tools. Arguably, behind these advances lies photolithography, the de facto standard micro/nanofabrication technique [1]. Despite unrivaled results in terms of parallelization, resolution, and feature size, photolithography is highly optimized for a short parameter space, namely few materials (metals or semiconductors) and even fewer substrates (flat silicon or glass). All ...

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