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Low Voltage Electron Microscopy: Principles and Applications by Natasha Erdman, David C. Bell

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List of Contributors

David C. Bell, School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02134, USA
 
Matthew F. Chisholm, Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
 
Niklas Dellby, Nion Co., Kirkland, WA 98033, USA
 
Natasha Erdman, JEOL USA Inc., Peabody, MA 01960, USA
 
Alexander Henstra, FEI Company, Building AAE, PO Box 80066, 5600 KA Eindhoven, The Netherlands
 
Juan Carlos Idrobo, Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
 
Robert Klie, Nanoscale Physics Group, Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
 
Ondrej L. Krivanek, Nion Co., Kirkland, WA 98033, USA
 
Tracy C. Lovejoy, Nion Co., Kirkland, WA 98033, USA
 
Quentin M. Ramasse, SuperSTEM Laboratory, STFC Daresbury, Daresbury, WA4 4AD, UK
 
Lubomir Tuma, FEI Company, Czech Republic s.r.o. Podnikatelska 2, 612 00 Brno, Czech Republic
 
Gerard N.A. van Veen, FEI Company, Building AAE, PO Box 80066, 5600 KA Eindhoven, The Netherlands
 
Richard J. Young, FEI Company, 5350 NE Dawson Creek Drive, Hillsboro OR 97124, USA
 
Wu Zhou, Department of Physics & Astronomy, Vanderbilt University, Nashville, TN 37235, USA and Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA

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