April 2006
Intermediate to advanced
724 pages
17h 31m
English
book
Patterns: Building Serial and Parallel Processes for IBM WebSphere Process Server V6
by Martin Keen, Andy Garratt, Ed Grossman, Dennis Stilhoff, Torsten Wilms, Dan Zrobok
Content preview from Patterns: Building Serial and Parallel Processes for IBM WebSphere Process Server V6
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Chapter 4. Application Integration and Extended Enterprise patterns 69
Limitations
The Exposed Serial Process application pattern is ideally suited for
straight-through processing where human interactions are not necessary to
complete an end-to-end process. If support for human interactions is needed to
complete certain process steps, consider the Workflow variation of this
Application pattern.
Similarly this pattern does not support the parallel execution of multiple tasks. As
the process composition technologies mature, we expect to see more
widespread use of the Exposed Parallel Process application pattern in Extended
Enterprise scenarios. ...
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