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Plasma Processing of Nanomaterials
book

Plasma Processing of Nanomaterials

by R. Mohan Sankaran
December 2017
Intermediate to advanced content levelIntermediate to advanced
430 pages
13h 44m
English
CRC Press
Content preview from Plasma Processing of Nanomaterials

8

Structural Control of Single-Walled Carbon Nanotubes by Plasma Chemical Vapor Deposition

Rikizo Hatakeyama

Toshiaki Kato

CONTENTS

8.1    Freestanding Single-Walled Carbon Nanotubes Growth

8.2    Chirality Distribution Control

8.3    Length Control

8.4    Metallicity Control

8.5    Chirality Control by Bottom-Up Electric-Field-Assisted Reactive Ion Etching

References

8.1    Freestanding Single-Walled Carbon Nanotubes Growth

The enormous potential of plasma chemical vapor deposition (CVD) for nanotube growth was first shown by Ren et al. in 1998 [1]. Since then, vertically and individually aligned multiwalled carbon nanotubes (MWNTs) have been grown by plasma CVD. Compared to carbon nanotubes (CNTs) grown by thermal CVD, which are spaghetti-like, ...

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Publisher Resources

ISBN: 9781439866771