Structural Control of Single-Walled Carbon Nanotubes by Plasma Chemical Vapor Deposition
CONTENTS
8.1 Freestanding Single-Walled Carbon Nanotubes Growth
8.2 Chirality Distribution Control
8.5 Chirality Control by Bottom-Up Electric-Field-Assisted Reactive Ion Etching
8.1 Freestanding Single-Walled Carbon Nanotubes Growth
The enormous potential of plasma chemical vapor deposition (CVD) for nanotube growth was first shown by Ren et al. in 1998 [1]. Since then, vertically and individually aligned multiwalled carbon nanotubes (MWNTs) have been grown by plasma CVD. Compared to carbon nanotubes (CNTs) grown by thermal CVD, which are spaghetti-like, ...
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