Preface

Artificial materials with atomic/molecular-level tailored structures are the final goal of material/device scientists and engineers. Such tailored structures enable electron wavefunction control, which will improve material performance and generate new photonic/electronic phenomena.

There are a lot of atomic/molecular assembling techniques to build the artificial materials, such as scanning tunneling microscopy (STM), molecular beam epitaxy (MBE), chemical vapor deposition (CVD), atomic layer deposition (ALD), sputtering, and so on. Recently, the molecular layer deposition (MLD) has received attention as the next-generation growth technique for organic thin-film materials. Although MLD was inspiered by ALD, a fundamental difference exists ...

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