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Computational Lithography by Xu Ma, Gonzalo R. Arce

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Appendix H

Software Guide

Chapter 5 and 6
GPSM_wa Generalized PSM optimization with discretization penalty and wavelet penalty in coherent imaging system.
GPSM_tv Generalized PSM optimization with discretization penalty and total variation penalty in coherent imaging system.
OPC_tv OPC optimization with discretization penalty and total variation penalty in coherent imaging system.
PSM_tv Two-phase PSM optimization with discretization penalty and total variation penalty in coherent imaging system.
Chapter 7
OPC_acaa OPC optimization using the average coherent approximation model in partially coherent imaging system.
OPC_fse OPC optimization using the Fourier series expansion model in partially coherent imaging system.
PSM_svd Two-phase PSM optimization using the singular value decomposition model in partially coherent imaging system.
SOCS Calculate the transmission cross-coefficient.
Chapter 8
double_pattern Double patterning optimization using two generalized PSMs in coherent imaging system.
proc_dct Post-processing based on the two dimensional discrete cosine transform.
PSM_dct Two-phase PSM optimization with the 2D DCT post-processing in partially coherent imaging system.
resisttone Photoresist tone reversing method in partially coherent imaging system.
Chapter 9
smo_OPC Simultaneous source and binary mask optimization.
smo_OPC_mask Binary mask optimization based on the SMO algorithm without source optimization.
smo_PSM Simultaneous source ...

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