Computational Lithography

Appendix H

Software Guide

Chapter 5 and 6
GPSM_wa	Generalized PSM optimization with discretization penalty and wavelet penalty in coherent imaging system.
GPSM_tv	Generalized PSM optimization with discretization penalty and total variation penalty in coherent imaging system.
OPC_tv	OPC optimization with discretization penalty and total variation penalty in coherent imaging system.
PSM_tv	Two-phase PSM optimization with discretization penalty and total variation penalty in coherent imaging system.
Chapter 7
OPC_acaa	OPC optimization using the average coherent approximation model in partially coherent imaging system.
OPC_fse	OPC optimization using the Fourier series expansion model in partially coherent imaging system.
PSM_svd	Two-phase PSM optimization using the singular value decomposition model in partially coherent imaging system.
SOCS	Calculate the transmission cross-coefficient.
Chapter 8
double_pattern	Double patterning optimization using two generalized PSMs in coherent imaging system.
proc_dct	Post-processing based on the two dimensional discrete cosine transform.
PSM_dct	Two-phase PSM optimization with the 2D DCT post-processing in partially coherent imaging system.
resisttone	Photoresist tone reversing method in partially coherent imaging system.
Chapter 9
smo_OPC	Simultaneous source and binary mask optimization.
smo_OPC_mask	Binary mask optimization based on the SMO algorithm without source optimization.
smo_PSM	Simultaneous source ...