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Computational Lithography by Xu Ma, Gonzalo R. Arce

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References

1. International technology roadmap for semiconductors. Technical report, http://public.itrs.net.

2. K. Adam. Domain decomposition methods for the electromagnetic simulation of scattering from three-dimensional structures with applications in lithography. PhD dissertation, Electrical Engineering and Computer Sciences, University of California, Berkeley, 2001.

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4. J. T. Azpiroz. Analysis and modeling of photomask near-fields in sub-wavelength deep ultraviolet lithography with optical proximity corrections. PhD dissertation, Department of Electrical Engineering, University of California, Los Angeles, 2004.

5. S. Babin, I. Yu. Kuzmin, and C. A. Mack. Comprehensive simulation of e-beam lithography processes using prolith/3D and temptation software tools. Proceedings of SPIE, Vol. 4186, p. 503, 2001.

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8. Y. A. Borodovsky. Lithographic enhancement method and apparatus for randomly spaced structures. US patent 5,424,154, Jun. 1995.

9. T. Brunner. Impact of lens aberrations on optical lithography. IBM Journal of Research and Development, 41(1/2): 57–67, 1997.

10. M. Burkhardt, C. Progler, ...

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