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Computational Lithography
book

Computational Lithography

by Gonzalo R. Arce, Xu Ma
September 2010
Intermediate to advanced
226 pages
6h 21m
English
Wiley
Content preview from Computational Lithography

Acronyms

ACAA Average Coherence Approximation Algorithm
BL Boundary Layer
CD Critical Dimension
CMTF Critical Modulation Transfer Function
DCT Discrete Cosine Transform
DEL Double Exposure Lithography
DPL Double Patterning Lithography
DUVL Deep Ultraviolet Lithography
EBL E-Beam Lithography
EUVL Extreme Ultraviolet Lithography
FDTD Finite-Difference Time-Domain Method
FFT Fast Fourier Transform
IC Integrated Circuit
ILT Inverse Lithography Technique
ITRS International Technology Roadmap for Semiconductors
MOS Metal Oxide Silicon
MoSi Molybdenum Silicide
MTF Modulation Transfer Function
NA Numerical Aperture
OAI Off-Axis Illumination
OPC Optical Proximity Correction
PAC Photoactive Compound
PCI Partially Coherent Illumination
PSF Point Spread Function
PSM Phase-Shifting Mask
RET Resolution Enhancement Technique
SMO Simultaneous Source and Mask Optimization
SNR Signal-to-Noise Ratio
SOCS Sum of Coherent System
SR1 Symmetric Rank One
SVD Singular Value Decomposition
WG Waveguide Method
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Publisher Resources

ISBN: 9781118043578Purchase book