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Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

Book Description

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods.

This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales.

  • Provides a comprehensive coverage of innovations in surface cleaning
  • Written by established experts in the surface cleaning field, presenting an authoritative resource
  • Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process

Table of Contents

  1. Cover image
  2. Title page
  3. Table of Contents
  4. Copyright
  5. List of Contributors
  6. About the Editors
  7. Preface
  8. Chapter 1. Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures
    1. Abstract
    2. 1 Introduction
    3. 2 Water-Caused Problems in Device Fabrication
    4. 3 HF Vapor Processing
    5. 4 Cryogenic Aerosol Nitrogen Cleaning
    6. 5 Supercritical Fluid Cleaning
    7. 6 Pinpoint Cleaning
    8. 7 Summary
    9. References
  9. Chapter 2. Gas-Phase Cleaning for Removal of Surface Contaminants
    1. Abstract
    2. 1 Introduction
    3. 2 Surface Contamination and Cleanliness Levels
    4. 3 General Principles of Gas-Phase Cleaning
    5. 4 Process Variables in Gas-Phase Cleaning
    6. 5 Cleaning Systems
    7. 6 Cost Benefits
    8. 7 Advantages and Disadvantages of Gas-Phase Cleaning
    9. 8 Applications
    10. 9 Summary
    11. AcknowledgementS
    12. Disclaimer
    13. References
  10. Chapter 3. Laser-Induced Spray Jet Cleaning
    1. Abstract
    2. 1 Introduction
    3. 2 Laser-Induced Spray Jet Cleaning
    4. 3 Nanoscale Particle Removal
    5. 4 LSJC Using Isopropyl Alcohol
    6. 5 Summary and Conclusions
    7. Acknowledgements
    8. References
  11. Chapter 4. Brush Scrubbing for Post-CMP Cleaning
    1. Abstract
    2. 1 Introduction
    3. 2 Particle Removal Mechanism
    4. 3 Process and Tool Kinematics
    5. 4 Consumables
    6. 5 Related Issues
    7. 6 Summary
    8. Appendix: Application of Tribology to Post-CMP Brush Scrubbing
    9. References
  12. Chapter 5. Contamination Removal From UV and EUV Photomasks
    1. Abstract
    2. 1 Introduction
    3. 2 Effect of Photomask Contamination on Lithography Process
    4. 3 Haze Effect on Photomask Surface
    5. 4 The Particle Removal Process
    6. 5 Organics Removal
    7. 6 EUVL Mask Cleaning
    8. 7 Summary
    9. References
  13. Chapter 6. Aqueous Displacement of Water-Immiscible Cleaning Solvents: Cleaning Enhancement Using Ultrasonics
    1. Abstract
    2. 1 Background
    3. 2 The Aqueous Displacement Solution Process
    4. 3 ADS Cleaning Process Requirements and Parameters
    5. 4 Drying
    6. 5 Evaluation for Hydrophilicity and Wettability
    7. 6 Results of Displacement Tests
    8. 7 Cleanliness Evaluation Tests
    9. 8 Summary
    10. Acknowledgements
    11. References
  14. Index