Chapter 2

Gas-Phase Cleaning for Removal of Surface Contaminants

Rajiv Kohli,    The Aerospace Corporation, Houston, TX, United States

Abstract

This chapter provides an overview of gas-phase cleaning for removal of surface contaminants. The absence of surface tension and very low viscosity allow gases to penetrate tight spaces and complex geometries for effective decontamination. The wide range of gas chemistries and process variables such as temperature, pressure, concentration, and flow rate enable effective and efficient removal of a variety of contaminants from various materials. Discussed are selected applications of gas-phase treatment for deposition tool chamber cleaning, dry etching, sterilization, and decontamination of nuclear materials ...

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