Contamination Removal From UV and EUV Photomasks
R. Prasanna Venkatesh1, Min-Su Kim2 and Jin-Goo Park2, 1Indian Institute of Technology Guwahati, Guwahati, Assam, India, 2Hanyang University ERICA, Ansan, Republic of Korea
Abstract
In semiconductor fabrication industries, photomask cleaning with no pattern damage is a critical issue, especially for advanced technology nodes. Thus, optimization of cleaning techniques adopted for photomask cleaning or development of new cleaning technique is always of great interest to meet process requirements. In this book chapter, the sources of contaminants on photomask and their impact on imprinted images are first discussed. Then a critical review is presented on the wide spectrum of cleaning ...
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