12.6.2. Routing for manufacturability
For manufacturability, OPC and CMP are two most important concerns for modern chip designs. The former adds or subtracts feature patterns to a mask to enhance the layout resolution and thus the printability of the mask patterns on the wafer, whereas the latter improves layout uniformity and chip planarization to achieve higher manufacturing yield.
12.6.2.1. OPC-aware routing
We will first introduce the manufacturing process. The process uses an optical lithography system and goes through many cycles of processing, each of which consists of two major steps: exposure followed by etching.
Figure 12.31 illustrates a basic optical lithography system. In the exposure step, it transfers the patterns on a
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