16.4. Thickness of Thin Films
16.4.1. Reflectance Measurements and FTIR
Optical reflectance measurements are widely used for measuring metallic, semiconductor, and dielectric layers. In principle these measurements can provide a wealth of information and can be used to determine the following:
- Layer thicknesses
- Indices of refraction
- Absorption coefficients
- Surface roughness and damage
- Porosity
- Composition
- Crystallinity
- Wafer curvature
Measurements can be made with monochromatic light, or over a broad range of wavelengths, even spanning the entire spectrum from near ultraviolet to the infrared. A single angle or multiple angles of incidence can be used, ranging from normal (perpendicular to the surface) to grazing incidence (almost ...
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