In Situ Characterization of Thin Film Growth

8

In situ deposition vapor monitoring

V. Matias,     Los Alamos National Laboratory, USA

R.H. Hammond,     Stanford University, USA

Abstract:

In situ deposition vapor monitoring is essential for accurate control of film thickness and elemental composition during physical vapor deposition. This chapter describes current state-of-the-art vapor sensing technologies and compares their relative merits. We review the quartz crystal microbalance, vapor ionization and optical absorption measurement techniques.

Key words

deposition rate monitoring

vapor flux monitor

quartz crystal microbalance

electron-impact emission spectroscopy

quadrupole mass spectroscopy

atomic absorption spectroscopy

8.1 Introduction

State-of-the-art thin-film deposition ...