In situ deposition vapor monitoring

V. Matias,     Los Alamos National Laboratory, USA

R.H. Hammond,     Stanford University, USA


In situ deposition vapor monitoring is essential for accurate control of film thickness and elemental composition during physical vapor deposition. This chapter describes current state-of-the-art vapor sensing technologies and compares their relative merits. We review the quartz crystal microbalance, vapor ionization and optical absorption measurement techniques.

Key words

deposition rate monitoring

vapor flux monitor

quartz crystal microbalance

electron-impact emission spectroscopy

quadrupole mass spectroscopy

atomic absorption spectroscopy

8.1 Introduction

State-of-the-art thin-film deposition ...

Get In Situ Characterization of Thin Film Growth now with O’Reilly online learning.

O’Reilly members experience live online training, plus books, videos, and digital content from 200+ publishers.