Chapter 2

Basic Technologies for Microsystems

Chapter Contents

2.1 Photolithography

2.2 Thin Films

2.2.1 Wet Deposition Techniques

2.2.2 Vapor Deposition Techniques

2.3 Silicon Micromachining

2.3.1 Etching

Wet Chemical Etching

Dry Etching

2.3.2 Surface Micromachining

2.3.3 Silicon Bulk Micromachining

Anisotropic Wet Chemical Etching

Bosch Process

2.4 Industrially Established Non-Silicon Processing

2.4.1 Quartz Etching

2.4.2 Glass Wet Etching

2.4.3 Photostructurable Glass

2.4.4 Powder Blasting

2.4.5 Plastic Microfabrication

Thick Resist Lithography

Laser Ablation

Photopolymerization

Thermoplastic Micromolding

2.5 Conclusions

References

This chapter aims to make the reader comfortable with the tremendous amount of fabrication techniques that ...

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