6The Future of Nonvolatile Memory
Motivation for research on new types of nonvolatile memory stems from concerns regarding NAND flash memory scaling. The latest technology node used in NAND flash manufacturing has entered sub-28-nm range, which is far more advanced than 20 years ago when emerging nonvolatile memory technologies were first investigated. On the one hand, some physical limitations have been significantly improved by the technology advances; for example, the reliability degradation due to the gate oxide thickness reduction has been improved by the application of high-K materials. On the other hand, the intrinsic limitations of all nanoscale devices—for example, process variations, etc.—have already generated visible impacts on all ...
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