December 2017
Intermediate to advanced
430 pages
13h 44m
English
CONTENTS
2.2.1 Current State of Lithography
2.2.2 Resolution and Depth of Focus
2.3 Extreme Ultraviolet Light Lithography
2.3.1 The Drive for Smaller Wavelength Lithography Sources
2.3.2 Extreme Ultraviolet (EUV) Emitting Plasma
2.3.4 EUV Sources and Collector Optics
2.3.5 Extreme Ultraviolet Light Source Debris Considerations
2.1 Introduction
The invention of the integrated circuit in the late 1950s eventually led to the development of the computer chip and laid the foundation for the ...