Plasma Processing of Nanomaterials

2

Extreme Ultraviolet Light Lithography for Producing Nanofeatures in Next-Generation Semiconductor Processing

John Sporre

David N. Ruzic

CONTENTS

2.1    Introduction

2.2    Optical Lithography

2.2.1    Current State of Lithography

2.2.2    Resolution and Depth of Focus

2.3    Extreme Ultraviolet Light Lithography

2.3.1    The Drive for Smaller Wavelength Lithography Sources

2.3.2    Extreme Ultraviolet (EUV) Emitting Plasma

2.3.3    EUV Fuels

2.3.4    EUV Sources and Collector Optics

2.3.5    Extreme Ultraviolet Light Source Debris Considerations

2.4    Conclusion

References

2.1    Introduction

The invention of the integrated circuit in the late 1950s eventually led to the development of the computer chip and laid the foundation for the ...