Book description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.- Provides the authority and expertise of leading contributors from an international board of authors
- Presents the latest release in the Advances in Imaging and Electron Physics series
- Updated release includes the latest information on Coulomb Interactions in Particle Beams
Table of contents
- Cover
- Title page
- Table of Contents
- Copyright
- Preface
- Chapter One: Introduction
- Chapter Two: Definitions, notation, and methods of analysis
- Chapter Three: Quadrupole potential functions
- Chapter Four: Quadrupole systems: Their suitability for specific tasks
- Chapter Five: Quadrupole data
- Appendix I: Nomenclature and Notation
- Appendix II: The shadow projection method of measuring aberration coefficients
- References
- Author index
- Subject index
Product information
- Title: Quadrupoles in Electron Lens Design
- Author(s):
- Release date: November 2022
- Publisher(s): Academic Press
- ISBN: 9780323988667
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