Phase-field modeling of thin film growth
A. Voigt, Technische Universität Dresden, Germany
Abstract:
Step-flow models are an efficient multiscale approach to model film growth, as they allow kinetic effects due to atomic interactions to be incorporated in continuum models. We consider phase-field approximations of such models and demonstrate their applicability through various examples, including trench formation on W(110), spiral and mound growth on Pt(111) and anomalous spiral growth on Si(001).
Key words
phase-field modeling
Ehrlich–Schwoebel barrier
degenerate mobility
spiral growth
3.1 Introduction
We think of the crystal film as an atomic landscape of terraces, separated by steps of one atomic height and build our modeling ...
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