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Analysing surface roughness evolution in thin films

Y. Kajikawa,     The University of Tokyo, Japan

Abstract:

Surface roughness is a key factor in determining film quality and the physical properties of materials deposited by chemical vapor deposition (CVD). However, there have been few attempts to comprehensively overview the mechanism underlying the evolution of film roughness during deposition, from atomic to macroscopic scale. In this chapter, the mechanisms causing roughness evolution during CVD are surveyed from a phenomenological viewpoint. Firstly, roughness formation processes at atomic scale are reviewed, focusing on homo-epitaxial growth. Next, roughness generation during hetero- or non-epitaxial growth is discussed, as well ...

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