Analysing surface roughness evolution in thin films
Y. Kajikawa, The University of Tokyo, Japan
Abstract:
Surface roughness is a key factor in determining film quality and the physical properties of materials deposited by chemical vapor deposition (CVD). However, there have been few attempts to comprehensively overview the mechanism underlying the evolution of film roughness during deposition, from atomic to macroscopic scale. In this chapter, the mechanisms causing roughness evolution during CVD are surveyed from a phenomenological viewpoint. Firstly, roughness formation processes at atomic scale are reviewed, focusing on homo-epitaxial growth. Next, roughness generation during hetero- or non-epitaxial growth is discussed, as well ...
Get Thin Film Growth now with the O’Reilly learning platform.
O’Reilly members experience books, live events, courses curated by job role, and more from O’Reilly and nearly 200 top publishers.
