Silicon nanostructured films grown on templated surfaces by oblique angle deposition

D. Ye,     Virginia Commonwealth University, USA

T.-M. Lu,     Rensselaer Polytechnic Institute, USA


We observed that the deposition of silicon (Si) nanostructured thin films on a patterned substrate with oblique angle incidence flux gives rise to a phenomenon referred to as ‘fan-out’ growth, which entails the overgrowth of the structures along the direction perpendicular to the incident deposition flux. We concluded in our Monte Carlo simulations that the side-sticking of incoming particles to the previously deposited particles is the cause of ‘fan-out’ growth. We have designed two methods to overcome fan-out growth: ‘two-phase’ rotation and ...

Get Thin Film Growth now with the O’Reilly learning platform.

O’Reilly members experience live online training, plus books, videos, and digital content from nearly 200 publishers.