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Silicon nanostructured films grown on templated surfaces by oblique angle deposition

D. Ye,     Virginia Commonwealth University, USA

T.-M. Lu,     Rensselaer Polytechnic Institute, USA

Abstract:

We observed that the deposition of silicon (Si) nanostructured thin films on a patterned substrate with oblique angle incidence flux gives rise to a phenomenon referred to as ‘fan-out’ growth, which entails the overgrowth of the structures along the direction perpendicular to the incident deposition flux. We concluded in our Monte Carlo simulations that the side-sticking of incoming particles to the previously deposited particles is the cause of ‘fan-out’ growth. We have designed two methods to overcome fan-out growth: ‘two-phase’ rotation and ...

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