Developments in Surface Contamination and Cleaning, Volume 8

Developments in Surface Contamination and Cleaning, Volume 8

by Rajiv Kohli, Kashmiri L. Mittal
Released November 2014
Publisher(s): William Andrew
ISBN: 9780323312714

Read it now on the O’Reilly learning platform with a 10-day free trial.

O’Reilly members get unlimited access to books, live events, courses curated by job role, and more from O’Reilly and nearly 200 top publishers.

Start your free trial

Book description

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

  • Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination
  • Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others
  • Covers novel wet and dry surface cleaning methods of increasing commercial importance

Table of contents

  1. Cover image
  2. Title page
  3. Table of Contents
  4. Copyright
  5. Contributors
  6. Preface
  7. About the Editors
  8. Chapter 1: How Green and Does it Clean: Methodologies for Assessing Cleaning Products for Safety and Performance
    1. Abstract
    2. 1 Background
    3. 2 Environmental Concerns
    4. 3 Green Cleaning
    5. 4 Regulatory Aspects
    6. 5 Product Selection
    7. 6 Green Assessment—What Makes a Product Green?
    8. 7 Performance Testing/Efficacy Evaluation
    9. 8 Summary
    10. Appendix A Contact Information for Cleaning Products and Suppliers
    11. Appendix B Contact Information for Soils and Contaminants and Suppliers
  9. Chapter 2: UV-Ozone Cleaning for Removal of Surface Contaminants
    1. Abstract
    2. Acknowledgment
    3. 1 Introduction
    4. 2 Surface Contamination and Cleanliness Levels
    5. 3 Principles of UV-Ozone Cleaning
    6. 4 Process Variables
    7. 5 Cleaning Systems
    8. 6 Advantages and Disadvantages of UV-Ozone Cleaning
    9. 7 Applications
    10. 8 Summary
    11. Disclaimer
  10. Chapter 3: Use of Water Ice for Removal of Surface Contaminants
    1. Abstract
    2. Acknowledgments
    3. 1 Introduction
    4. 2 Surface Contamination and Surface Cleanliness Levels
    5. 3 Theoretical Considerations
    6. 4 Description of the Process
    7. 5 Cleaning Systems
    8. 6 Cost Considerations
    9. 7 Advantages and Disadvantages
    10. 8 Applications
    11. 9 Summary and Conclusions
    12. Disclaimer
  11. Chapter 4: Post-CMP Cleaning
    1. Abstract
    2. 1 Introduction
    3. 2 Forces on Particulate Contaminants in a Post-CMP Cleaning Process
    4. 3 Types of Post-CMP Cleaning Processes
    5. 4 Megasonic Cleaning
    6. 5 Cleaning Chemistries
    7. 6 Summary
  12. Chapter 5: A Brief Review of the Cleaning Process for Electronic Device Fabrication
    1. Abstract
    2. 1 Introduction
    3. 2 Cleaning of Inorganic Contamination
    4. 3 Cleaning of Organic Contaminants
    5. 4 Effects of Surfactants in Cleaning Solutions
    6. 5 Wet Cleaning for Removing Trace Metals after Etching Process
    7. 6 Silicon Product Wet Etching Process
    8. 7 Summary and Conclusions
  13. Index

Product information

  • Title: Developments in Surface Contamination and Cleaning, Volume 8
  • Author(s): Rajiv Kohli, Kashmiri L. Mittal
  • Release date: November 2014
  • Publisher(s): William Andrew
  • ISBN: 9780323312714