12
Film Formation
To fabricate discrete devices and integrated circuits, we use many different kinds of thin films. We can classify thin films into four groups: thermal oxides, dielectric layers, polycrystalline silicon, and metal films. Figure 1 shows a schematic view of a conventional silicon n-channel MOSFET (metal-oxide-semiconductor field-effect transistor) that uses all four groups of films. The first important thin film from the thermal oxide group is the gate-oxide layer, under which a conducting channel can be formed between the source and the drain. A related layer is the field oxide, which provides isolation ...
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