Epitaxial Growth of Complex Metal Oxides

Index

Note: Page numbers followed by “f” and “t” indicate figures and tables respectively.

A

All-scale hierarchical architecture, 403

Anode thin films, 458–459

Antiferromagnetic insulator (AFMI), 310–311

Aqueous CSD process, 75–76

Area-specific resistance (ASR), 446

Atomic layer deposition (ALD), 449–450

Automatic matching network, 33

B

Ba_1-xK_xBiO₃ (BKBO) system, 114–115

C

Cathode thin film, 455–458, 456t, 457f

Cation stoichiometry transfer, PLD growth

plasma plume, 235–236, 236f

scattering and sputtering processes, 233, 234f

strontium titanate, 238–240, 239f

substrate surface relevant processes, 236–237, 238f

target ablation, 233–235

CBS, See Complex band structure (CBS)

Ceramic superconductor processing, 87–88

Ceramic protonic fuel ...