List of Contributors

  1. G. Ardila, IMEP-LAHC/Minatec, CNRS-Grenoble INP, UJF, 38016 Grenoble, France
  2. Francis Balestra, IMEP-LAHC, Minatec, Grenoble-Alpes University, 38016 Grenoble Cedex 1, France
  3. L. A. M. Barea, Department of Electrical Engineering, UFSCAR, São Carlos, SP 13565-905, Brazil
  4. J. P. H. Benschop, ASML, Veldhoven, The Netherlands
  5. D. A. Borton, School of Engineering and the Brown Institute for Brain Science, Brown University, Providence, RI 02912, USA
  6. C. Schulte-Braucks, Peter Grünberg Institut-9 and JARA-FIT, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany
  7. D. Buca, Peter Grünberg Institut-9 and JARA-FIT, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany
  8. S. Burger, Zuse Institute Berlin (ZIB), Takustraße 7, 14195 Berlin, Germany and JCMwave GmbH, Bolivarallee 22, 14050 Berlin, Germany
  9. A.V. Butenko, Department of Physics and Faculty of Engineering, Jack and Pearl Institute of Advanced Technology, Bar Ilan University, Ramat Gan 52900, Israel
  10. Kyung-Eun Byun, Device Laboratory, Samsung Advanced Institute of Technology, Suwon 443-803, South Korea
  11. Yeonchoo Cho, Device Laboratory, Samsung Advanced Institute of Technology, Suwon 443-803, South Korea
  12. J. K. Choi, Memory R&D Division, SK Hynix, Icheon-si, Gyeonggi-do 467-701, South Korea
  13. W. Crooijmans, Philips Research, High Tech Campus 34, Eindhoven, The Netherlands
  14. S. Datta, Department of Electrical Engineering, The Pennsylvania State University, University Park, PA 16802, USA and Department of Electrical ...

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