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Fundamentals of Silicon Carbide Technology
book

Fundamentals of Silicon Carbide Technology

by Tsunenobu Kimoto, James A. Cooper
November 2014
Intermediate to advanced
400 pages
21h 11m
English
Wiley-IEEE Press
Content preview from Fundamentals of Silicon Carbide Technology

Index

  1. (112gen0)
  2. (12gen00)
  3.  
  4. A face
  5. ab-initio calculation
  6. above-gap excitation
  7. absorption
    1. coefficient
    2. depth
    3. edge
  8. AC motor (or motor drive)
  9. accelerometer
  10. acceptor-like state
  11. accumulation-layer FET (ACCUFET)
  12. Acheson process
  13. activation (of dopants)
  14. airbridge
  15. Al/Ti contact
  16. alphabet line
  17. ambipolar
    1. diffusion coefficient (DA)
    2. diffusion equation (ADE)
    3. diffusion length (LA)
    4. lifetime (τA)
  18. amorphization
  19. Ampere's law
  20. amphoteric impurity
  21. anisotropy
    1. of breakdown electric field
    2. of mobility
  22. annealing
    1. hydrogen
    2. in-situ
    3. metallization
    4. nitridation
    5. POCl3
    6. post-implantation
    7. post-metallization
    8. post-oxidation (POA)
    9. rapid thermal (RTA)
    10. re-oxidation
  23. anode shorts (in a thyristor)
  24. anodic oxidation
  25. anti-phase domain
  26. anti-site defect
  27. armature flux (of a motor)
  28. asymmetrical IGBT
  29. asynchronous (induction) motor (or motor drive)
  30. atomic force microscopy (AFM)
  31. Auger recombination
  32. avalanche breakdown
  33. avalanche multiplication
  34. avalanche photodiode
  35. avalanche region
    1. in an avalanche photodiode (APD)
    2. in an IMPATT diode
  36.  
  37. back-emf (in a motor)
  38. Baliga's figure-of-merit
  39. band (also energy band)
    1. conduction band minima
    2. diagram
    3. offset
    4. structure
    5. surface band bending
  40. bandgap
    1. energy
    2. narrowing
    3. temperature dependence of
  41. barrier height
    1. for injection into SiO2
    2. inhomogeneity
    3. metal-semiconductor (Schottky)
    4. lowering of (Schottky ...
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