Functionalization of Semiconductor Surfaces

CONTRIBUTORS

Damien Aureau, Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, USA

Stacey F. Bent, Department of Chemical Engineering, Stanford University,

Stanford, CA, USA

Steven L. Bernasek, Department of Chemistry, Princeton University, Princeton, NJ, USA

Ying Wei Cai, Department of Chemistry, Princeton University, Princeton, NJ, USA; Befar Chemical Group Co., Ltd, Binzhou, Shandong, China

Yves J. Chabal, Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, USA

Robert J. Hamers, Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA

Keli Han, State Key Laboratory of Molecular Reaction Dynamics, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian, China

Md. Zakir Hossain, Department of Materials Science and Engineering, Northwestern University, Evanston, IL, USA; Graduate School of Engineering, Gunma University, Kiryu, Japan.

Erik Johansson, Department of Chemistry, California Institute of Technology, Pasadena, CA, USA

Maki Kawai, RIKEN (The Institute of Physical and Chemical Research), Wako, Saitama, Japan; Department of Advanced Materials Science, The University of Tokyo, Kashiwa, Chiba, Japan

Do Hwan Kim, Division of Science Education, Daegu University, Gyeongbuk, Republic of Korea

Sehun Kim, Molecular-Level Interface Research Center, Department of Chemistry, KAIST, Daejeon, Republic of Korea

Hangil Lee, Department of Chemistry, Sookmyung Women's ...