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Computational Lithography by Xu Ma, Gonzalo R. Arce

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Acknowledgments

We are thankful to many colleagues for their advice and contributions. It has been our good fortune to have had the opportunity to interact and have received the guidance of some of the world's leaders in optical lithography from the Intel Corporation. In particular, we are indebted to Dr. Christof Krautschik, Dr. Yan Borodovsky, Dr. Vivek Singh, and Dr. Jorge Garcia, all from the Intel Corporation, for their guidance and support. Our contributions to this field and the elaboration of this book would not have been possible without their support. We thank Dr. Dennis Prather from the University of Delaware for insightful discussions on optics, polarization, and optical wavefront propagation. The discussions on optimization and inverse problems as applied to RET design with Dr. Yinbo Li, Dr. David Luke, Dr. Javier Garcia-Frias, and Dr. Ken Barner, all from the University of Delaware, are greatly appreciated. We also thank Dr. Avideh Zakhor from the University of California, Berkeley, and Dr. Stephen Hsu from AMSL Corporation for insightful discussions on RETs. The material in this textbook has benefited greatly from our interactions with many bright students at the University of Delaware, with special appreciation to Dr. Zhongmin Wang, Peng Ye, Yuehao Wu, Dr. Lu Zhang, Dr. Bo Gui, and Xiantao Sun. We are particularly grateful to Prof. Glenn Boreman from CREOL at the University of Central Florida for his support in including this book in the Wiley Series in Pure and ...

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