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Computational Lithography
book

Computational Lithography

by Gonzalo R. Arce, Xu Ma
September 2010
Intermediate to advanced
226 pages
6h 21m
English
Wiley
Content preview from Computational Lithography

Index

l2 norm criterion

aerial image

amplitude impulse response

application

dark-field

light-field

areas

interior transmission

normal boundary

tangential boundary

average coherence

approximation algorithm (ACAA)

coherent length

complex degree of coherence

contrast

convolution

kernel

matrix

corner rounding

cost sensitivity

critical dimension

cutoff frequency

data fidelity term

defocus distance

diffraction

index

orders

dose

effective source

effects

diffraction edge

thick-mask

eigenfunction

eigenvalue decomposition

eigenvalues

electric and magnetic fields

electromagnetic coupling

feasible region

feature(s)

assisting

subresolution

target

filter

Gaussian low-pass

low-pass

finite-difference time-domain (FDTD) method

first-order coherent approximation

Fourier

optics

series expansion

function

amplitude

circular step

concave

constraint

convex

cost

critical modulation transfer (CMTF)

hard threshold

hyperbolic tangent

model

modulation transfer (MTF)

objective

quadratic model

sigmoid

unit step

Haar wavelet

halftone techniques

hammer

harmonic mean

hierarchy management

IC

dimension

fabrication

manufacturing

pattern

structure

illumination

annular

circular

coherent

conventional

CQUEST

dipole

fourfold

incoherent

Köhler

off-axis (OAI)

on-axis

partially coherent (PCI)

quadrupole

QUASAR

separated

imaging system

coherent

incoherent

partially coherent

intensity

intensity imbalance

interference

International Technology Roadmap

for Semiconductors

intrinsic impedance

Kirchhoff

approximation

boundary ...

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Publisher Resources

ISBN: 9781118043578Purchase book