Plasma Processing of Nanomaterials

10

Modeling Aspects of Plasma-Enhanced Chemical Vapor Deposition of Carbon-Based Materials

Erik Neyts

Ming Mao

Maxie Eckert

Annemie Bogaerts

CONTENTS

10.1  Introduction

10.2  Plasma Chemistry Modeling for Plasma-Enhanced Chemical Vapor Deposition (PECVD)

10.2.1  Analytical Modeling

10.2.2  0D Chemical Kinetics or Global Modeling

10.2.3  Fluid Modeling

10.2.4  Kinetic Models

10.2.5  Hybrid Modeling

10.3  Modeling the Deposition Process for PECVD

10.3.1  Mechanistic Modeling

10.3.2  Detailed Atomistic Simulations: General Overview

10.3.3  Molecular Dynamics (MD) Simulations for Amorphous Hydrogenated Carbon (a-C:H) Thin Film Deposition

10.3.3.1  Hydrocarbon Reactions with a-C:H Surface Sites

10.3.3.2  Simulated a-C:H Growth

10.3.4  MD Simulations ...