
Photopolymerization-based additive manufacturing 159
(Li et al ., 2013b). Due to their hydrophobic nature, they are only soluble in
organic solvents and therefore are not suitable to produce hydrogels. Water-
soluble derivatives of R1 and M2CMK have recently been introduced for
two-photon induced polymerization. Generally, initiation occurs via bimo-
lecular electron transfer process (Rumi et al ., 2008) that is generally less
ef cient compared to classical Norrish Type I cleavage processes due to the
possibility of back electron transfer and the solvent cage effect, especially in
aqueous systems (Ullrich et al ., 2005).
With the exception ...