
15: POLY(IMIDE)S 361
Table 15.11 Types of Photo Acid Gener-
ators [131]
Compound Type
Diazonaphthoquinones
Nitrobenzylsulfonates
Triaryl sulfonium salts (
3
S
+
SbF
−
6
)
Diphenyliodonium salts
Polymer types
Table 15.12 Compounds for Rea-
ctive End Capping [131]
Compound
Nadic anhydride
Itaconic anhydride
2,3-Dimethylmaleic anhydride
Ethynylaniline
The final compositionis coatedonto the substrate by
spin-coating. After drying,the materialcan be exposed
to UV light through a mask. Subsequent etching is
done with an aqueous alkaline solution [130].
A varied method uses only poly(amic acid ester)s.
These compounds are the precursors for PIs. After
etching, the substrate