
96 Semiconductors: Integrated Circuit Design for Manufacturability
pattern transfer enhancements (optical proximity correction [OPC], inverse
lithography technology [ILT], source mask optimization [SMO]) [14,15], as
well as manufacturability requirements across manufacturing sites, calls for
more comprehensive methods to capture design intent and make it available
for the manufacturing line, to support the infrastructure for pattern qual-
ity improvement developed among design, computer-aided design (CAD),
mask, and manufacturing organizations.
3.2.1 Device Models and Design Intent
Comparing design intent represented by drawn layout