106CHAPTER 4 Non-lithographic techniques for nanostructuring
0246810
03468
10
[µm]
[µm]
0.00[nm]22.07
012345
012345
[µm]
[µm]
0.00[nm]192.98
(a)(b)
FIGURE 4.24
AFM image of electric field nanostructured indium thin films. (a) As-deposited 15 nm thin
film and (b) after the treatment of 3.33 kV/cm.
Source: Reprinted with permission from Prashant Kumar et al. (2008). Copyright 2008, World Scientific.
00.511.5
0.0012.14
2
00.511.52
[nm]
[µm]
[µm]
00.511.52
[µm]
00.511.5
0.0017.98
2
[nm]
[µm]
00.511.52
[µm]
00.511.52
0.0014.63
[nm]
[µm]
(b)
(c)
(a)
FIGURE 4.25
AFM images of gold thin films, (a) As-deposited and subjected to electric fields of (b)
0.4 kV/cm and (c) 0.66 ...
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