Emerging Nanotechnologies for Manufacturing, 2nd Edition

154 CHAPTER 5 Engineered carbon nanotube field emission devices

deposited at required positions, or the FIB can be used to mill through the substrate

to the catalyst layers beneath. Wu etal. reported the fabrication of gatelike structures

by sputtering using FIB. Metal-gated CNT eld emitter arrays were fabricated using

a multilayer structure with an embedded catalyst layer instead of depositing the cata-

lyst into milled holes, as is common practice [300]. A 15 nm ITO diffusion barrier

was deposited onto a Si substrate followed by 10 nm Ni, which served as the CNT

catalyst. A 1 µm thick insulating SiO

2

layer was deposited onto the Ni catalyst ...