
Contents
Preface
to
Series
ix
Preface
χ
Contributors xii
APPLICATION OF MATERIALS CHARACTERIZATION TECH-
NIQUES
TO SILICON EPITAXIAL GROWTH
1.1 Introduction I
1.2
Silicon
Epitaxial Growth 2
Basic Chemical Reactions 2, Precleaning Considerations 3,
Reactor Types 3
1.3 Film and Process Characterization 4
Crystal
Quality 4, Preclean Quality 6, Thickness 9, Dopant
Concentration and Dopant Profiling 12
1.4
Selective
Growth 14
Basic Process Considerations 14»
Defect
Density and Growth
Morphology 15, Preclean Quality 18, Thickness 18
1.5 Sij _
x
Gc
x
Epitaxial Growth 18
Material
Considerations l8, Reactor Types 19
1.6
Si
j_
x
Ge
x
Material Characterizatio ...