Characterization in Silicon Processing

1.7

Summary

A broad array of characterization techniques have been applied to silicon-based

epitaxial

films.

This chapter has presented a number of process and material char-

acterization problems and has given the

most

widely

used approaches for each

problem. The examples have attempted to illustrate the typical situations in which

a

given technique is applicable. It should be

noted

that

many characterization tasks

(film

thickness, carrier concentration, Ge

content

in Si^^Ge^

films,

etc.) have

multiple approaches, allowing the user considerable

flexibility.

A close relationship exists between characterization capability and process im-

provement ...