October 2013
Intermediate to advanced
240 pages
11h 53m
English
Content preview from Characterization in Silicon Processing
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Surface Roughness: Measurement, Formation
by Sputtering, Impact on Depth Profiling*
26
Surface
roughness is commonly measured using mechanical and optical profilers,
scanning electron microscopes, and atomic force and scanning tunneling micro-
scopes.
Angle-resolved scatterometers can also be applied to this measurement. The
analysis
surface can be roughened by ion
bombardment,
and roughness
will
degrade
depth
resolution in a
depth
profile. Rotation of the sample during sputtering can
reduce this roughening.
Mechanical Profiler
Depth
resolution 0.5 nm
Minimum
step 2.5—5 nm
Maximum
step -150 μπι
Lateral
resolution 0.1-25 μπι, depending on stylu ...
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