October 2013
Intermediate to advanced
240 pages
11h 53m
English
Content preview from Characterization in Silicon Processing
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The RBS spectra were obtained using a 16 MeV Ο beam. Spectra from different
processing times are superimposed. The 3 s anneal formed 360 Â of
TiSi
2
.
The
silicide
formation was complete after 8 s anneal, approximately 1420 Â
TiSi
2
is
formed.
Note
in this study no titanium rich compounds were detected. These
studies
demonstrate the direct formation of
TiSi
2
by rapid thermal annealing.
X-Ray Diffraction Measurements
Both X-ray and electron diffraction provide information
about
the microstructure
and
crystallinity
of
films,
the information not obtained by the resistance or RBS
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SEC.
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