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Characterization in Silicon Processing
book

Characterization in Silicon Processing

by Yale Strausser
October 2013
Intermediate to advanced
240 pages
11h 53m
English
Newnes
Content preview from Characterization in Silicon Processing
Focused
Ion
Beams (FIBs)
8
JON
ORLOFF
Introduction
Focused ion beams (FIBs), in the present context, means ion beams with a focused
spot
size of
less
than
1 μηι with a
current
density in the focused
spot
/« 1 A-cm
-2
.
Only in the past 15
years
have such capabilities in an FIB become possible, making
the FIB
tool
extremely useful. FIB tools are now
widely
used for micromachining,
failure
analysis,
and quality assurance in the integrated circuit fabrication process,
as
well
as for surface
analysis,
lithography, direct implantation, etc. In fact, in the
first two of these applications, FIBs are proving to be indispensable for semicon-
ductor
devic ...
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Publisher Resources

ISBN: 9780080523422