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Characterization in Silicon Processing
book

Characterization in Silicon Processing

by Yale Strausser
October 2013
Intermediate to advanced
240 pages
11h 53m
English
Newnes
Content preview from Characterization in Silicon Processing
The best technique
is
scanning tunneling microscopy
(STM),
which
can map
out
the
localized surface
and
produce images
and
quantitative roughness factors
characteristic
of
a surface morphology (see Figure 5.2).
The
range
and
frequency
of
the feature sizes
can be
determined from
the
data
and can be
correlated back
to
reflectivity
measurements.
The
area examined with this technique
is
small,
so
sev-
eral
measurements across
the
sample must
be
done
to
insure
the
correct repre-
sentation
of
the surface
is
found. Figure
5.3
shows
that
the
reflectivity
of
the films
correlates
directly
to the
deposition regime,
that
is, whether
it is
surface reaction ...
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Publisher Resources

ISBN: 9780080523422