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Characterization in Silicon Processing
book

Characterization in Silicon Processing

by Yale Strausser
October 2013
Intermediate to advanced
240 pages
11h 53m
English
Newnes
Content preview from Characterization in Silicon Processing
scanning electron microscopy (continued)
substrate
surface defects 8
summary
205
thickness, tungsten film 123, 125
wafer
cross
section
48
scanning force microscopy (SFM) 207
scanning transmission electron microscopy
(STEM) 206
scanning tunneling microscopy (STM)
crystalline
surfaces 35
grain
boundary analysis 109
grain
size
103
island growth 37
nanostructure
surfaces 103
polysilicon film surface 42
silicon
film
images
35
silicon
surface 79
summary
207
tungsten film surface 127
Schottky
barrier
carrier
concentration in epi layers 13
diode characteristics 76, 80
height 56, 147, 175
interfaces 79
silicide conductors 53
SE See spectroscopic ellipsometry ...
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Publisher Resources

ISBN: 9780080523422